FBH-02 Prior Information Notice – Wet Chemical Processing Tool (Single Wafer Etching)

The Ferdinand-Braun-Institut (FBH) plans to procure a wet chemical processing tool for single wafer etching within the framework of the EU-funded APECS programme. The system is intended for the processing of compound semiconductor materials such as InP, GaAs, AlGaAs, and GaN. The tool will enable highly precise and reproducible etching processes on a per-wafer basis, including endpoint detection functionality. Compared to batch processing, the single wafer approach ensures improved process control and reproducibility, which is essential for low-volume, high-precision semiconductor manufacturing. The equipment will be installed in an existing cleanroom environment and must be compatible with ISO class 5 requirements. The procurement procedure is planned for 2026.